Effect of Silicon Application on Peach Tree Responses to Water Stress
DOI:
https://doi.org/10.71318/s1khzg37Keywords:
Foliar Si Application, Nutrient updake, droughtAbstract
Water deficits during the first years after planting fruit trees can impact future productivity by reducing vegetative growth and canopy development. Previous studies have shown that silicon (Si) application enhances plant tolerance to abiotic stresses such as drought, specifically improving growth, nutrient uptake, and physiological mechanisms related to water status and leaf anatomy. Therefore, this study aimed to evaluate the effect of Si on water status, sap flow, gas exchange, and potassium (K) and nitrogen (N) uptake in young peach trees under water stress. The experiment was conducted with young peach trees under greenhouse conditions using a completely randomized block design with four treatments: two water regimens (well-watered at 100% and water-stressed at 50% of evapotranspiration requirements) combined with two Si concentrations (0 or 20 mg L-1) foliar sprayed. Si application enhanced water status in water-stressed trees, although this improvement was not associated with changes in sap flow, gas exchange, or stomatal density. Vegetative growth increased only in well-watered plants receiving Si. Additionally, Si applications increased K concentration in leaves and spring shoots of water-stressed trees, with no effect observed in well-watered trees. Leaf N concentration increased under both Si application and water deficit, but no interaction between these factors was detected. These findings suggest that Si foliar application may be a promising strategy to maintain trees water status under water deficit.
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